Disclosed are methods and systems for design of a foot orthotic, and a foot orthotic device designed in accord therewith. More specifically described is an individualized foot orthotic device to correct and/or restore the ideal alignment and/or positioning of foot structures. In the method, sequential pressure is applied to regions on a plantar foot surface, and positional information is obtained about each region. Based on the positional information, an orthotic profile is determined, for design of one or more custom, individualized foot orthotic devices for a subject.