High-purity quinoline derivative and method for manufacturing same

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专利权人:

Eisai R&；D Management Co.; Ltd.

发明人:

Taiju Nakamura,Taichi Abe,Yusuke Miyashita,Hirofumi Kuroda,Yusuke Ayata,Atsushi Akao

申请号：

US16229805

公开号：

US10407393B2

申请日:

2018.12.21

申请国别(地区):

US

年份:

2019

代理人:

摘要：

Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/