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IMPLANT HAVING AN INCREASED NEGATIVE SURFACE CHARGER
专利权人:
QVANTEQ AG
发明人:
Arik ZUCKER,Stefano BUZZI,Armin W. MÄDER,Vincent MILLERET,Martin EHRBAR,Algirdas ZIOGAS
申请号:
US15037008
公开号:
US20160256598A1
申请日:
2014.11.12
申请国别(地区):
US
年份:
2016
代理人:
摘要:
An implant for implantation into a body is provided with a surface that is provided for contact with the body or a bodily fluid when implanted and which surface has a first surface charge when in a first state. The surface assumes a second state having a second surface charge as a result of surface treatment, the second surface charge being a lower positive surface charge or a higher negative surface charge than the first surface charge. The implant is used for regulating an adsorption of proteins on the surface of the implant in terms of type, quantity and/or conformation of certain proteins by means of a defined second state of the surface, which has a defined second surface charge and/or a defined predetermined composition of an oxide layer of the surface.
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