Han Soo Kim;Dongchang Choi;Yoon Hee Heo;Ho Chan Ji;Changho Cho;Won Jin Chung;Sunhwa Kim
发明人:
Sunhwa Kim,Ho Chan Ji,Dongchang Choi,Han Soo Kim,Yoon Hee Heo,Changho Cho,Won Jin Chung
申请号：
US13452456
公开号：
US08829068B2
申请日:
2012.04.20
申请国别(地区):
US
年份:
2014
代理人:
摘要：
The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.
