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Device and methods for adaptive resistance inhibiting inverse compton scattering microbeam and nanobeam radiosurgery
专利权人:
Velayudhan Sahadevan
发明人:
Velayudhan Sahadevan
申请号:
US13743297
公开号:
US09155910B1
申请日:
2013.01.16
申请国别(地区):
US
年份:
2015
代理人:
摘要:
This invention relates to adaptive resistance inhibiting 100 to 1,000 Gy, single fraction radiosurgery with inverse Compton scattering gamma ray microbeam and nanobeam. The distance from two adjacent microbeams or the nanobeam generate peak and valley dose. Proliferation of normal tissues clonogenic cells from low or no dose valley region to peak dose regions makes the normal tissue tolerance to to 100 to 1,000 Gy. The collilinear electron beam and gamma ray microbeam and nanobeam are generated in microfocus carbon tubes in a tissue equivalent primary collimator. Electron beam is absorbed by the tissue equivalent primary collimator. Focusing anode and magnets and multiwalled carbon nanotubes channels the microbeam and nanobeam as focused beams. Methods of spread out or spot scanned or raster scanned collilinear gamma ray microbeam and nanobeam radiosurgery are implemented. Adaptive resistance to cancer treatment is inhibited by inactivation of cancer cells repair capabilities.
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中国工程科技知识中心
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