A system for the administration of modified plasma to a subject, including: (a) a non thermal plasma (NTP) emitting source for emitting a plasma beam (b) a plasma coupling mechanism (PCM) with a plasma beam dish having at least one opening for the passage of the plasma beam the plasma beam dish having a first surface and a second opposite surface. The first surface of the plasma beam dish includes: at least one coupling element selected from the group consisting of: (1) at least one ferroelectric element for providing the field (2) at least one ferromagnetic element for providing the field (3) at least one piezoelectric element for providing the field and (4) at least one piezomagnetic element for providing the field. The system additionally includes at least one reflecting element configured to focus the NTP beam, thereby providing the modified plasma.