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ARTIFICIAL NAIL COMPOSITION, ARTIFICIAL NAIL, METHOD FOR FORMING ARTIFICIAL NAIL, METHOD FOR REMOVING ARTIFICIAL NAIL, AND NAIL ART KIT
专利权人:
FUJIFILM Corporation
发明人:
Yukie WATANABE,Hidekazu OOHASHI,Junya ABE
申请号:
US14825362
公开号:
US20150342320A1
申请日:
2015.08.13
申请国别(地区):
US
年份:
2015
代理人:
摘要:
It is an object of the present invention to provide an artificial nail composition having excellent stability over time and excellent surface gloss, removability, adhesion, and water resistance of an artificial nail obtained thereby, an artificial nail employing the artificial nail composition, a method for forming an artificial nail, a method for removing an artificial nail, and a nail art kit.An artificial nail composition comprising (Component A) an ethylenically unsaturated group- and primary amino group- and/or secondary amino group-containing compound, and (Component B) a photopolymerization initiator. Furthermore, Component A is preferably a specific compound represented by Formula (I) and/or a compound represented by Formula (II)
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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