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COMPOSITION FOR ACOUSTIC WAVE PROBE, SILICONE RESIN FOR ACOUSTIC WAVE PROBE, ACOUSTIC WAVE PROBE, ULTRASOUND PROBE, ACOUSTIC WAVE MEASUREMENT APPARATUS, ULTRASOUND DIAGNOSTIC APPARATUS, PHOTOACOUSTIC WAVE MEASUREMENT APPARATUS, AND ULTRASOUND ENDOSCOPE
专利权人:
FUJIFILM Corporation;Shin-Etsu Chemical Co., Ltd.
发明人:
Yoshihiro NAKAI,Shigeki UEHIRA,Taichi KITAGAWA,Nobuaki MATSUMOTO
申请号:
US16811636
公开号:
US20200206393A1
申请日:
2020.03.06
申请国别(地区):
US
年份:
2020
代理人:
摘要:
A composition for an acoustic wave probe, containing the following ingredients (A) to (D): (A) a linear polysiloxane having a vinyl group; (B) a linear polysiloxane having two or more Si—;H groups in a molecular chain; (C) a polysiloxane resin; and (D) surface-treated silica particles having an average primary particle diameter more than 16 nm and less than 100 nm, as well as, a silicone resin for an acoustic wave probe, an acoustic wave probe, an ultrasound probe, an acoustic wave measurement apparatus, an ultrasound diagnostic apparatus, a photoacoustic wave measurement apparatus, and an ultrasound endoscope, using the composition for an acoustic wave probe.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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