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Methods and composition for suppression of deep seated fungal growth on skin
专利权人:
David Changaris
发明人:
David G. Changaris,Kelly Sullivan
申请号:
US15793978
公开号:
US10105332B1
申请日:
2017.10.25
申请国别(地区):
US
年份:
2018
代理人:
摘要:
The present disclosure relates to methods and compositions for suppressing the growth of fungus on selected areas of the skin. A composition for suppressing deep seated fungal growth comprising conjugated linoleic acid, Punicic acid, or combination thereof, and niacinamide and L-aspartic acid is provided herein. Methods of making and using the composition are also presently provided.
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