Methods and composition for suppression of deep seated fungal growth on skin

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专利权人:

David Changaris

发明人:

David G. Changaris,Kelly Sullivan

申请号：

US15793978

公开号：

US10105332B1

申请日:

2017.10.25

申请国别(地区):

US

年份:

2018

代理人:

摘要：

The present disclosure relates to methods and compositions for suppressing the growth of fungus on selected areas of the skin. A composition for suppressing deep seated fungal growth comprising conjugated linoleic acid, Punicic acid, or combination thereof, and niacinamide and L-aspartic acid is provided herein. Methods of making and using the composition are also presently provided.

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