PROBLEM TO BE SOLVED: To provide a gas cleaning device effectively decomposing and removing harmful substances such as VOC (Volatile Organic Compound) by utilizing effective catalysis using an oxide semiconductor.SOLUTION: The gas cleaning device includes: a cleaning treatment part 20 for decomposing and treating a gas to be treated and a heat exchanger 10 of the cleaned gas discharged from the cleaning treatment part 20 and the gas to be treated, which is sent into the cleaning treatment part 20. The cleaning treatment part 20 includes a catalyzer 31 in which the oxide semiconductor is carried on a base material comprising a porous body and heating parts 32 and 24 inside a treatment container 22 constituting a treatment space of the gas to be treated. An end part of the catalyzer 31 is fixed to a support 34 provided on a wall of the treatment container 22, and at the contact part of the support 34 and the catalyzer 31, the gas to be treated cannot pass through/leak.COPYRIGHT: (C)2013,JPO&INPIT【課題】 酸化物半導体による効果的な触媒作用を利用して、VOCなどの有害物質を効果的に分解除去することができる気体の浄化装置を提供する。【解決手段】 被処理気体を分解して処理する浄化処理部20と、浄化処理部20から排出される浄化後の気体と浄化処理部20に送入される被処理気体との熱交換器10を備え、浄化処理部20は、被処理気体の処理空間を構成する処理容器22内に、多孔体からなる基材に酸化物半導体を担持させた触媒体31と加熱部32、24とを備え、触媒体31の端部は、処理容器22の壁に設けられた支持体34に固定され、支持体34と触媒体31との接触部において、被処理気体が通過・漏洩できない構造を特徴とする。【選択図】 図1
