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X-ray method for the measurement, characterization, and analysis of periodic structures
专利权人:
Sigray; Inc.
发明人:
Wenbing Yun,Sylvia Jia Yun Lewis,Janos Kirz
申请号:
US14712917
公开号:
US09874531B2
申请日:
2015.05.15
申请国别(地区):
US
年份:
2018
代理人:
摘要:
Periodic spatial patterns of x-ray illumination are used to gather information about periodic objects. The structured illumination may be created using the interaction of a coherent or partially coherent x-ray source with a beam splitting grating to create a Talbot interference pattern with periodic structure. The object having periodic structures to be measured is then placed into the structured illumination, and the ensemble of signals from the multiple illumination spots is analyzed to determine various properties of the object and its structures. Applications to x-ray absorption/transmission, small angle x-ray scattering, x-ray fluorescence, x-ray reflectance, and x-ray diffraction are all possible using the method of the invention.
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中国工程科技知识中心
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http://www.ckcest.cn/home/

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