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Implant pour la distraction du rachis
专利权人:
Kyphon SÀRL
发明人:
申请号:
EP10009487.9
公开号:
EP2263582A3
申请日:
1997.12.23
申请国别(地区):
EP
年份:
2013
代理人:
摘要:
A spinal distraction implant alleviates pain associated with spinal stenosis, and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant provides a spinal extension stop while allowing freedom of spinal flexion. The implant comprises:a first implant member (22) having an upper surface configured to contact an inferior portion of a first spinous process; anda second implant member (24) having a lower surface configured to contact a superior portion of a second spinous process; whereinthe second implant member is movably coupled to the first implant member such that the upper surface of the first implant member is displaceable away from the lower surface of the second implant member.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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