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Interspinous process implants and methods of use
专利权人:
James F. Zucherman
发明人:
James F. Zucherman,Ken Y. Hsu,Charles J. Winslow,Scott A. Yerby,John J. Flynn,Steven T. Mitchell,John A. Markwart
申请号:
US11771092
公开号:
US08454659B2
申请日:
2007.06.29
申请国别(地区):
US
年份:
2013
代理人:
摘要:
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
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