您的位置: 首页 > 农业专利 > 详情页

PHOTOIRRADIATION SUBSTRATE
专利权人:
SHARP KABUSHIKI KAISHA;OSAKA CITY UNIVERSITY;SBI PHARMACEUTICALS CO., LTD.
发明人:
KATSUJI IGUCHI,HIROYA SATO,TAKASHI YOSHIMOTO,JUN MORI,TOSHIYUKI OZAWA,KUNIO AWAZU
申请号:
US16311527
公开号:
US20190321653A1
申请日:
2017.06.21
申请国别(地区):
US
年份:
2019
代理人:
摘要:
The present invention includes: a front-side positive trace (2P) disposed on a flexible substrate (5); a positive external connection line (12P) connected to the front-side positive trace (2P) to supply electric power; and LED chips (4) provided to the flexible substrate (5) and connected to the front-side positive trace (2P), wherein an electric resistance between the positive external connection line (12P) and one of the LED chips (4) which is farthest from the positive external connection line (12P) is less than an internal resistance of the one of the LED chips (4).
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充