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WET WIPE CHEMICAL SOLUTION AND WET WIPE
专利权人:
发明人:
Takahiro Ueda,Nami Kondoh,Takeshi Bandoh
申请号:
US14430529
公开号:
US20150265523A1
申请日:
2013.09.26
申请国别(地区):
US
年份:
2015
代理人:
摘要:
A chemical solution for wet wipe and a wet wipe that are paraben-free and allow ease of extraction thereof even with higher water content than conventional products. A paraben-free chemical solution for wet wipe is provided in which the product of the chemical solution film thickness measured by a measurement method specified below and the chemical solution surface tension is at least 810 um·mN/m. For measuring the chemical solution film thickness, first, 0.03 ml of the chemical solution was dropped on a glass slide and another glass slide of the same size was gently placed thereon. Then, allow the glass slides to stand for 30 seconds, and measure the liquid film thickness of the chemical solution interposed between the glass slides by magnified observation with a microscope from a position immediately lateral to the glass slides.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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