The invention discloses a method for the inspection of multiple exposure image mixing using overlapping exposure. The method comprises steps: S100, setting the respective exposure time values of a plurality of light source devices which have at least one of different wavelengths and radiation angles; S200, carrying out repeated exposure and sequentially enabling the light source devices to be turned off after the corresponding exposure time values, so as to enable the light source devices to sequentially irradiate a to-be-detected circuit substrate and to generate a mixed detection image generated by image capturing equipment in the exposure time values; S300, outputting the detection image so as to carry out analysis and inspection. Therefore, one detection image records the mixed image information under different irradiation, thereby preventing all light source devices for capturing images. The method obtains a plurality of images at the same time, thereby simplifying the process and effectively shortening
