PROBLEM TO BE SOLVED: To provide a chitosan film that is superior in workability and drying efficiency during film formation, has excellent water resistance, plasticity and strength, and is low in acid residual rate.SOLUTION: A chitosan-containing composition contains 100 pts.mass of chitosan, 0.5-150 pts.mass of polyhydric alcohol, and 0.5-100 pts.mass of zein.【課題】膜形成の際の作業性と乾燥効率がよく、耐水性、可塑性および強度に優れ、且つ酸の残存率の低いキトサン膜の提供。【解決手段】キトサン１００質量部と、多価アルコール０．５～１５０質量部と、ゼイン０．５～１００質量部とを含有することを特徴とする、キトサン含有組成物。【選択図】なし
