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专利权人:
KUIN BIOTECH INTERNATIONAL CO.; LTD.
发明人:
LING, HUNG YI,林鸿益,林鴻益
申请号:
TW106216891
公开号:
TWM566079U
申请日:
2017.11.10
申请国别(地区):
TW
年份:
2018
代理人:
摘要:
This Chong Zuo Department Off Yu mono- Seed, which repair Complex Yong Yu Group Woven, has the thinning Layer films for fixing micro- cut mark surface, wherein The thinnings Layer films include a thinning Layer Mo Zhu Body, an and micro- cut mark Biao Mian structures Layer, wherein The thinnings Layer Mo Zhu Body Bao Han Complex Number Ge Net lattice, it arranges to The Net Ge Regulations The among what The thinning Layer Mo Zhu Body, the micro- cut mark Biao Mian structures Layer Department You Complex Number Ge outer surface Gu of The Ding Inter away from micro- cut mark Suo Group at, the outer surfaces Gu such as The Ding Inter away from Ge mono- Gu of Over of micro- cut mark Inter Ding Inter away from Bi Ci Inter every, and the outer surfaces Gu such as micro- cut mark Biao Mian structures Layer Tou Over The of The is Dinged phase Right Side Biao Mian With The thinning Layer Mo Zhu Body Xiang Knots of the Inter away from micro- cut mark and is closed.本創作係關於一種用於組織修復具有固定微切痕表面的薄化層膜,其中該薄化層膜包含一薄化層膜主體,以及一微切痕表面結構層,其中該薄化層膜主體包含複數個網格,該網格規則地排列於該薄化層膜主體之中,該微切痕表面結構層係由複數個外表面固定間距微切痕所組成,該等外表面固定間距微切痕之間各透過一固定間距彼此間隔,及該微切痕表面結構層透過該等外表面固定間距微切痕之相對側表面與該薄化層膜主體相結合。1’‧‧‧薄化層膜10’‧‧‧薄化層膜主體15’‧‧‧結構界面20’‧‧‧微切痕表面結構層25’‧‧‧外表面固定間距微切痕30’‧‧‧固定間距40’‧‧‧網格
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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