Rong Deng,Aleksey M. Pinyayev,Valerie J. Henderson,Craig A. Powell
申请号：
US16690276
公开号：
US20200190715A1
申请日:
2019.11.21
申请国别(地区):
US
年份:
2020
代理人:
摘要：
Aspects of the present disclosure relate to methods and apparatuses for relofting nonwoven substrates. During the relofting process, a substrate is directed to advance in a first direction such that a length of the substrate is in a facing relationship with a radiation source. The advancing substrate is relofted by irradiating the length of the substrate with infrared radiation from the infrared radiation source. The substrate comprises a first caliper upstream of the radiation source and the substrate comprises a second caliper downstream of the radiation source greater than the first caliper. The substrate may also be redirected around an axis to advance the substrate in a second direction, wherein the second direction is different than the first direction. The axis may be selectively movable between a first position and a second position to selectively subject the substrate to infrared radiation and remove the substrate from the infrared radiation.
