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METHOD OF PRODUCING AND PROVIDING AN ANTIMICROBIAL AGENT THAT EXERTS AN EXTENDED RESIDUAL EFFECT
专利权人:
Dabney Patents; L.L.C.
发明人:
Paul DABNEY
申请号:
US16812595
公开号:
US20200206380A1
申请日:
2020.03.09
申请国别(地区):
US
年份:
2020
代理人:
摘要:
A method, system, and apparatus for sterilization, decontamination, and antimicrobial therapeutic treatment, which may include a dispensing device to cover a person, plant, animal, surface, enclosure, room or other structure or area with an antimicrobial solution. Radiation sources may expose the antimicrobial agent to a certain wavelength of radiation. The combination of the solution and the radiation may create a synergistic reaction that causes an effect greater than the radiation or solution separately. The same reaction creates a residual antimicrobial effect. A container, area or passageway including an dispensing device a solution so that a person, plant, animal or object is covered or saturated with an antimicrobial solution. Exposure to a certain wavelength of radiation creates a residual, synergistic reaction resulting in a “supercharged” antimicrobial agent that exhibits retained antimicrobial effects that exist longer than previously discovered due to the antimicrobial agent being exposed to the radiation together.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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