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PERSONAL CARE COMPOSITION COMPRISING A REACTION PRODUCT OF EPOXY COMPOUND AND AMINO SILANE
专利权人:
모멘티브 퍼포먼스 머티리얼즈 인크.
发明人:
벤자민 팔크,안네 뒤소,라라, 피. 피에시-코르소
申请号:
KR1020107009842
公开号:
KR1016893170000B1
申请日:
2008.10.30
申请国别(地区):
KR
年份:
2016
代理人:
摘要:
The present invention provides a process for the preparation of a compound of formula (I), comprising: a) an oxirane or oxetane compound comprising at least two oxirane or oxetane groups; And b) the formula: N (H) (R l ) R 2 Si (OR 3) 3-abc (OR 4) a (R 5 Si (OR 6) d (R 7) e one having a) b R 8c of amino silane; provides a personal care composition suitable for the reaction product, hair treatment which comprises a composition comprising a, wherein, R 1 is a 1, including the carbon atom of H or from 1 to 20 hydrocarbon radical <; / RTI >; R 2 is independently selected from the group consisting of divalent linear or branched hydrocarbon radicals comprising from 1 to 60 carbons; R 4 is a hydrocarbon radical comprising 3 to 200 carbon atoms; R <; 5 >; is independently selected from the group consisting of oxygen or a divalent linear or branched hydrocarbon radical consisting of 1-60 carbons; R 3 , R 6 , R 7 and R 8 are each independently selected from the group of monovalent linear or branched hydrocarbon radicals having from 1 to 200 carbon atoms; Subscript b is 0 or a positive number and has a value in the range from 0 to 3; Subscript a is a positive number less than or equal to 0 and subscripts b and c are 0 or positive numbers and values within the range from 0 to 3, subject to the constraint "(a + b + c) <;3" To have; The subscripts d and e are 0 or positive numbers and have a value in the range of 0 to 3, subject to the restriction of (d + e) = 3, when treating the hair with the personal care composition , The hair has a hydrophobic response to water.본 발명은, a) 적어도 둘의 옥시란 또는 옥세탄 기들을 포함하여 구성되는 하나의 옥시란 또는 옥세탄 화합물; 그리고 b) 식: N(H)(Rl)R2Si(OR3)3-a-b-c(OR4)a (R5Si(OR6)d(R7)e)bR8c 을 가지는 하나의 아미노 실란;의 반응 생성물을 포함하는 조성물을 포함하여 구성되는, 모발 처리에 적합한 퍼스널 케어 조성물을 제공하며, 상기 식에서, R1 은, H 또는 1 내지 20의 탄소 원자들을 포함하는 1가 탄화수소 라디칼로 구성되는 군으로부터 선택되고; R2 는, 1 - 60의 탄소들로 구성되는 2가 선형 또는 가지형 탄화수소 라디칼로 구성되는 군으로부터 독립적으로 선택되며; R4 는, 3 내지 200의 탄소 원자들을 포함하는 탄화수소 라디칼이고; R5 는, 산소 또는 1 - 60의 탄소들로
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