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ELECTRON BEAM IRRADIATION DEVICE AND ELECTRON BEAM IRRADIATION METHOD
专利权人:
发明人:
MATSUMURA TATSUYA
申请号:
IN201817021156
公开号:
IN201817021156A
申请日:
2018.06.06
申请国别(地区):
IN
年份:
2018
代理人:
摘要:
An electron beam irradiation device is provided with: an electron beam generation unit for generating an electron beam a housing part that forms a vacuum space for accommodating the electron beam generation unit an electron beam guide part that has a proximal end connected to the housing part, is in communication with the vacuum space, has a distal end that is provided with an elongated cylindrical member that can be inserted into the inside of a container via an opening in the container, and has the electron beam generated by the electron beam generation unit pass therein an electron beam emission window that is provided on the distal end of the electron beam guide part and through which the electron beam is emitted and an adjustment unit for adjusting the path of the electron beam in the electron beam guide part. The adjustment unit is disposed outside the vacuum space on the proximal side of the electron beam guide part.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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