The present invention relates to a method and an apparatus for cultivating a plant by repeatedly exposing the roots of the plant to a nutrient solution and air alternately, the method comprising the steps of: supplying a nutrient solution to a plant accommodation space in which the roots of the plant are located if the nutrient solution reaches a predetermined level, maintaining the predetermined level by discharging the nutrient solution to the outside of the plant accommodation space through a level adjustment member formed on the predetermined level and blocking the supply of the nutrient solution and discharging the nutrient solution from the plant accommodation space through a nutrient solution outlet located below the level adjustment member.La présente invention concerne un procédé et un appareil permettant de cultiver une plante en exposant répétitivement et alternativement les racines de la plante à une solution nutritive et à de lair, le procédé comprenant les étapes suivantes : fournir une solution nutritive à un espace daccueil de plante dans lequel les racines de la plante sont situées si la solution nutritive atteint un niveau prédéterminé, maintenir le niveau prédéterminé en refoulant la solution nutritive vers lextérieur de lespace daccueil de plante au travers dun élément de réglage de niveau formé au niveau prédéterminé et bloquer lalimentation en solution nutritive et refouler la solution nutritive de lespace daccueil de plante par une sortie de solution nutritive située sous le niveau de lélément de réglage de niveau.본 발명은 식물뿌리를 양액과 공기에 번갈아 반복 노출시키는 식물재배방법 및 장치에 관한 것으로서, 식물의 뿌리가 위치된 식물수용공간에 양액을 공급하는 단계 양액이 소정 수위에 도달하면, 양액을 상기 소정 수위에 형성된 수위조절구를 통해 상기 식물수용공간의 외부로 배출시켜 상기 소정 수위를 유지하는 단계 및 양액의 공급을 차단하고, 상기 식물수용공간에서 상기 수위조절구보다 아래에 위치된 양액배출구로 양액을 배출하는 단계를 포함하는 것을 특징으로 한다.
