Chamber apparatus and extreme ultraviolet light generation system

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专利权人:

Toshihiro Nishisaka

发明人:

Toshihiro Nishisaka,Yukio Watanabe,Tamotsu Abe,Osamu Wakabayashi

申请号：

US13122354

公开号：

US08759804B2

申请日:

2011.03.11

申请国别(地区):

US

年份:

2014

代理人:

摘要：

A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated a collector mirror provided in the chamber for collecting the extreme ultraviolet light a support for securing the collector mirror to the chamber and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/