正孔注入層および輸送層のための改善されたドーピング法

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专利权人:

日産化学工業株式会社

发明人:

セシャドリ ベンカタラマナン,チョプラ ニートゥ

申请号：

JP20140534536

公开号：

JP6269489(B2)

申请日:

2012.10.03

申请国别(地区):

日本

年份:

2018

代理人:

摘要：

A method including combining at least one first compound in a neutral form with at least one ionic dopant in a first solvent system to provide a first doped reaction product, isolating the first doped reaction product in solid form, and combining the isolated first doped reaction product with at least one conjugated polymer in neutral form in a second solvent system to form a second doped reaction product including an oxidized form of the conjugated polymer a neutral form of the first compound. Advantages include better stability, ease of use, and lower metal content. Applications include organic electronic devices including OLEDs.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/