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Photocurable resin composition
专利权人:
Yoko Shibasaki
发明人:
Yoko Shibasaki,Masao Arima
申请号:
US13383324
公开号:
US08748502B2
申请日:
2010.07.14
申请国别(地区):
US
年份:
2014
代理人:
摘要:
Disclosed is a photocurable resin composition which comprises a photopolymerization initiator having two oxime ester groups in the molecule, a resin containing a carboxyl group, and a compound having two or more ethylenically unsaturated groups in the molecule. The composition can achieve high sensitivity, can provide a dried coating film having excellent touch dryness of fingers, can prevent the generation of an out gas during curing or the like, and can achieve all of excellent alignment accuracy, high productivity and high reliability in the formation of a solder resist for a printed wiring board or the like.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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