PROBLEM TO BE SOLVED: To provide a device for supplying a mixture gas with concentration suitable for treatment.SOLUTION: A mixture gas supply device 1A comprises: temperature adjustment means 20 for adjusting temperature related to a hydrogen occlusion alloy 10 for outputting a first gas； first flow rate control means 30 for controlling a flow rate for mixing of the first gas； second flow rate control means 40 for controlling a flow rate 70 for mixing of the second gas different from the first gas； and mixing means 50 for outputting a mixture gas obtained by mixing the first gas output by the first flow rate control means 30 and the second gas output by the second flow rate control means 40.SELECTED DRAWING: Figure 1【課題】治療に適する濃度の混合気体を供給する装置を提供する。【解決手段】混合気体供給装置１Ａは、第１気体を出力する水素吸蔵合金１０に関する温度を調節する温度調節手段２０と、第１気体の混合用流量を制御する第１流量制御手段３０と、第１気体と異なる第２気体の混合用流量７０を制御する第２流量制御手段４０と、第１流量制御手段３０の出力した第１気体と第２流量制御手段４０の出力した第２気体とを混合した混合気体を出力する混合手段５０と、を備える。【選択図】図１
