COMPOSÉ AMIDE OU SES SELS, ET INHIBITEUR DE FORMATION DE BIOFILM, AGENT D'ÉLIMINATION DE BIOFILMS ET BACTÉRICIDES, COMPRENANT LE COMPOSÉ AMIDE OU SES SELS

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专利权人:

THE UNIVERSITY OF TOKYO;OTSUKA CHEMICAL CO., LTD.

发明人:

申请号：

EP07830633.9

公开号：

EP2077260B1

申请日:

2007.10.26

申请国别(地区):

EP

年份:

2015

代理人:

摘要：

The present invention provides a new amide compound and salt thereof that is capable of inhibiting biofilm formation or removing deposited biofilm. The present invention also provides a biofilm formation inhibitor or a biofilm remover containing the amide compound or salt thereof as an active ingredient. An amide compound or salt thereof according to the present invention is denoted by General Formula (1): wherein R 1 is a hydrogen atom or a hydroxyl group, R 2 is a C 5-12 alkyl group, and Q is a substituent denoted by Formula (Q1) or (Q2), wherein n and m are 0 or 1.

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