PETTERSSON, MARIA,ENGQVIST, HAKAN,OLOFSSON, JOHANNA,HULTMAN, LARS
申请号：
CA2845113
公开号：
CA2845113A1
申请日:
2012.08.30
申请国别(地区):
CA
年份:
2013
代理人:
摘要：
An implant comprises a substrate and a coating on a surface of the substrate, and the coating comprises silicon nitride and has a thickness of from about 1 to about 15 micrometer. A method of providing the implant comprises coating a surface of the implant substrate with the coating comprising silicon nitride and having a thickness of from about 1 to about 15 micrometer by physical vapour deposition.
