An interspinous process spacer implant for being implanted between spinous processes of neighboring vertebrae is provided. It comprises- a first body (1) with a first central part (3) which extends over a first length (l1) in a first longitudinal direction (5) and a first height (h1) in a first transverse direction (7), the first body (1) being equipped with a first upper projection (13) extending upwards from the first upper bearing surface (9) and with a first lower projection (15) extending downwards from the first lower bearing surface (11), where the first upper projection (13) and the first lower projection (15) are located in opposite longitudinal sections of the of the first central part (3)- a second body (29) with a second central part (31) which extends over a second length (l2) in a second longitudinal direction (33) and a second height (h2) in a second transverse direction (35), the second body (29) being equipped with a second upper projection (41) extending upwards from the second upper bearing surface (37) of the second central part (31) and with a second lower projection (43) extending downwards from the second lower bearing surface (39) of the second central part (31), where the second upper projection (41) and the second lower projection (43) are located in opposite longitudinal sections of the of the second central part (31)- a hinge (5) connecting the first central part (3) and the second central part (31) to one another which is located off-center in the first and second longitudinal directions (5, 33) in each of the first and second central parts (3, 31) and allows rotating the first body (1) and the second body (29) relative to one another in a forward direction about a rotation axis (RA) to vary an angle between the first and second longitudinal directions, where the hinge (5) is located in the first and second central parts (3, 31) in the respective longitudinal section where the first upper projection (13) extends upwards and where the sec
