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APPAREIL D'EXPOSITION À UN RAYONNEMENT PAR FAISCEAU D'ÉLECTRONS
专利权人:
Hitachi Zosen Corporation
发明人:
申请号:
EP17869899.9
公开号:
EP3540744A4
申请日:
2017.11.02
申请国别(地区):
EP
年份:
2019
代理人:
摘要:
Provided is an electron beam irradiating device capable of emitting an electron beam (B) from an electron beam generation source surrounded by a vacuum chamber to outside of the vacuum chamber through an electron beam exit window (4). The electron beam exit window (4) includes: a grid (6); a window foil (9) allowing the electron beam to pass therethrough; and a frame-shaped pressing member (10) pressing the window foil (9) against the grid (6). The surface of the grid (6) has a groove section (81) having an annular shape. A metal gasket (11) is pressed between the groove section (81) and the window foil (9).
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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