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Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
专利权人:
Masahiro Watanabe
发明人:
Masahiro Watanabe,Takashi Hiroi,Maki Tanaka,Hiroyuki Shinada,Yasutsugu Usami
申请号:
US12754181
公开号:
US08212227B2
申请日:
2010.04.05
申请国别(地区):
US
年份:
2012
代理人:
摘要:
An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of the specimen which is set on a table. The height detection system includes an illumination system configured to direct first and second beams of light through a mask with a multi-slit pattern to a surface of the specimen at substantially opposite azimuth angles and at substantially equal angles of incidence, first and second detectors which respectively detect first and second multi-slit images of the first and second beams reflected from the specimen and generate output signals thereof, and a device which receives the output signals and generates a comparison signal which is responsive to the height of the specimen. An objective lens of the electron beam unit is controlled in accordance with the comparison signal.
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中国工程科技知识中心
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