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Signal enhancement mechanism for dual-gate ion sensitive field effect transistor in on-chip disease diagnostic platform
专利权人:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
发明人:
Lin Ching-Hui,Cheng Chun-Ren,Huang Shih-Fen,Chang Yi-Hsien
申请号:
US201715581673
公开号:
US9958443(B2)
申请日:
2017.04.28
申请国别(地区):
美国
年份:
2018
代理人:
Haynes and Boone, LLP
摘要:
Dual-gate ion-sensitive field effect transistors (ISFETs) for disease diagnostics are disclosed herein. An exemplary dual-gate ISFET includes a gate structure and a fluidic gate structure disposed over opposite surfaces of a device substrate. The gate structure is disposed over a channel region defined between a source region and a drain region in the device substrate. The fluidic gate structure includes a sensing well that is disposed over the channel region. The sensing well includes a sensing layer and an electrolyte solution. The electrolyte solution includes a constituent that can react with a product of an enzymatic reaction that occurs when an enzyme-modified detection mechanism detects an analyte. The sensing layer can react with a first ion generated from the enzymatic reaction and a second ion generated from a reaction between the product of the enzymatic reaction and the constituent, such that the dual-gate ISFET generates an enhanced electrical signal.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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