毛髪化粧料

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专利权人:

株式会社;資生堂

发明人:

今藤 泰輔,倉島 巧,豊田 智規,清水 秀樹

申请号：

JP2013081994

公开号：

JP6230805B2

申请日:

2013.04.10

申请国别(地区):

JP

年份:

2017

代理人:

摘要：

PROBLEM TO BE SOLVED: To provide a hair cosmetic preparation which can dissolve wax stably and transparently, while having an excellent setting ability or arranging ability, with low irritation to the scalp.SOLUTION: (a) Water dispersion medium, (b) wax, and (c) a nonionic surfactant with HLB of from 10 to 15 are comprised. The compounding ratio (mass ratio) of (c) a nonionic surfactant/(b) wax is 1.0 or more, and an ionic surfactant is not substantially contained.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/