您的位置: 首页 > 农业专利 > 详情页

ALIPHATIC POLYURETHANE OPTICAL ENDPOINT DETECTION WINDOWS AND CMP POLISHING PADS CONTAINING THEM
专利权人:
Rohm and Haas Electronic Materials CMP Holdings, Inc. ;Dow Global Technologies LLC
发明人:
Chiou Nan-Rong,Islam Mohammad T.,Jacob George C.
申请号:
US201715491610
公开号:
US2018304438(A1)
申请日:
2017.04.19
申请国别(地区):
美国
年份:
2018
代理人:
摘要:
The present invention provides a chemical mechanical (CMP) polishing pad for polishing, for example, a semiconductor substrate, having one or more endpoint detection windows (windows) which at a thickness of 2 mm would have a UV cut-off at a wavelength of 325 nm or lower which are the product of a reaction mixture of (A) from 30 to 56 wt. % of one or more cycloaliphatic diisocyanates or polyisocyanates with (B) from 43 to 69.9999 a polyol mixture of (i) a polymeric diol having an average molecular weight of from 500 to 1,500, such as a polycarbonate diol for hard windows and a polyether polyol for soft windows and (ii) a triol having an average molecular weight of from 120 to 320 in a weight ratio of (B)(i) polymeric diol to (B)(ii) triol ranging from 1.6:1 to 5.2:1, and a catalyst, preferably a secondary or tertiary amine, all weight percent's based on the total solids weight of the reaction mixture.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充