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配向制御された細胞パターンの回収ツール
专利权人:
学校法人東京女子医科大学
发明人:
黒 田 正 敏,岡 野 光 夫,大 和 雅 之,清 水 達 也,秋 山 義 勝
申请号:
JP2008293094
公开号:
JP5329185B2
申请日:
2008.11.17
申请国别(地区):
JP
年份:
2013
代理人:
摘要:

PROBLEM TO BE SOLVED: To provide a cell pattern recovery tool which can quickly recover a cell pattern in a low invasive condition for cells, while stably and surely maintaining the cell pattern controlled in orientation.

SOLUTION: This cell pattern recovery tool controlled in orientation includes a substrate layer having a surface subjected to an easily adhesive treatment, a temperature-responsive polymer layer formed on the substrate layer and having a silane-treated surface, and cell adhesion-inhibiting material layers formed on the temperature-sensitive polymer layer. In the cell adhesion-inhibiting material layers the width between the cell adhesion-inhibiting regions covered with the cell adhesion-inhibiting material, the cell adhesion-inhibiting regions being present on both the sides of a cell-adhesive region on which the temperature-responsive polymer layer is exposed, is equal to or less than the maximum width enabling cell culture controlled in extension direction.

COPYRIGHT: (C)2010,JPO&INPIT

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