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Système de traitement laser ophtalmologique
专利权人:
Ziemer Ophthalmic Systems AG
发明人:
Rathjen, Christian,Hertzberg, Joachim
申请号:
EP14002939.8
公开号:
EP2990015B1
申请日:
2014.08.25
申请国别(地区):
EP
年份:
2018
代理人:
摘要:
An ophthalmological laser treatment system comprising a laser source (2) for producing laser radiation, a light projector (3) for focusing the laser radiation onto a focus (F) and a scanner system (5) for moving the focus (F) along a work line (p) comprises a monitoring system (6), which comprises a light detector (60) and is configured to monitor, by way of a light path (r), a monitored region (m) moving together with the focus (F). The monitoring system (6) is configured to monitor a monitored region (m), which moves together with the focus (F) with a fixed geometric assignment to the focus (F) and is for example disposed upstream of the focus (F) in the work direction and not yet worked on by laser radiation.
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