Two Phase Depilatory Composition
- 专利权人:
- Lauren Ciemnolonski
- 发明人:
- Lauren Ciemnolonski,Steven T. Adamy
- 申请号：
- US13221220
- 公开号：
- US20120052035A1
- 申请日:
- 2011.08.30
- 申请国别(地区):
- US
- 年份:
- 2012
- 代理人:
- 摘要：
- An improvement on the prior art dual phase chemical depilatory composition. The present invention is a dual phase present composition comprising: (1) a polymer (2) depilatory active ingredients (3) complexing agent and (4) polyol.
- 来源网站：
- 中国工程科技知识中心
相关发明人
相关专利
- HETEROCYCLIC COMPOUND AND ANTI-MALIGNANT-TUMOR AGENT CONTAINING THE SAME AS ACTIVE INGREDIENT
- THIOLS AS FLAVORING INGREDIENT
- AGENTS AMELIORANT LE STRESS DU AU CARBONYLE
- PYRIDINE AND PYRAZINE DERIVATIVES, PREPARATION OF THESE COMPOUNDS, FUNGICIDAL AGENTS CONTAINING THESE COMPOUNDS AS ACTIVE INGREDIENTS, AND THE USE OF SUCH COMPOUNDS OR AGENTS AS FUNGICIDES IN AGRICULTURE AND IN HORTICULTURE
- PYRIDINE AND PYRAZINE DERIVATIVES, PREPARATION OF THESE COMPOUNDS, FUNGICIDAL AGENTS CONTAINING THESE COMPOUNDS AS ACTIVE INGREDIENTS, AND THE USE OF SUCH COMPOUNDS OR AGENTS AS FUNGICIDES IN AGRICULTURE AND IN HORTICULTURE
