PROBLEM TO BE SOLVED: To provide a plant cultivation apparatus which can evenly spread a nutrient solution on the whole area of a cultivation rack, while reducing the amount of the nutrient solution used therein as much as possible, and has good responsibility for the adjustment of the amount of the nutrient solution.SOLUTION: The plant cultivation apparatus has a cultivation rack 2 on whose upper surface cultivation containers are put, and a nutrient solution supply mechanism 4 for supplying the nutrient solution on the upper surface of the cultivation rack 2, wherein fine uneven structures 21 are formed on the approximately whole upper surface of the cultivation rack 2, and the nutrient solution supplied from the nutrient solution supply mechanism 4 is spread on the approximately whole upper surface of the cultivation rack 2 through the fine uneven structures 21.COPYRIGHT: (C)2012,JPO&INPIT【課題】養液の使用量を可及的に少なくしながらも、その養液を万遍なく栽培棚全体に行き渡らせることができるとともに、養液量の調整の応答性を良くする。【解決手段】上面に栽培容器が載置される栽培棚2と、この栽培棚2の上面に養液を供給する養液供給機構4とを具備し、前記栽培棚2の上面略全体に微細凹凸構造21が形成されており、前記養液供給機構4により供給された養液が、微細凹凸構造21を伝って栽培棚2の上面略全体に行き渡るように構成している。【選択図】図1
