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皮膚洗淨劑組成物
专利权人:
KAO CORPORATION
发明人:
YAMADA, KOUHEI,山田晃平,TAJIMA, HITOSHI,田岛准,田島準
申请号:
TW104121071
公开号:
TW201603825A
申请日:
2015.06.29
申请国别(地区):
TW
年份:
2016
代理人:
摘要:
A skin cleanser composition containing the following components (A), (B), (C), (D), (E), (F), and (G): (A) 0.5-20 mass% of an oil having a viscosity exceeding 30 mPa.s at 30 DEG C; (B) 0.5-20 mass% of an oil having a viscosity of 30 mPa.s or lower at 30 DEG C; (C) 1-15 mass% of a nonionic surfactant having an HLB of 10 or higher and having a residue obtained by removing a hydrogen atom from at least one hydroxyl group in a sugar, reduction sugar, or polyglycerol as a hydrophilic group; (D) 1-15 mass% of a nonionic surfactant having an HLB of 8 or lower; (E) 10-60 mass% of a polyhydric alcohol; (F) 10-50 mass% of water; and (G) 4-45 mass% of a nonionic surfactant having an HLB of 10 or higher and having a polyoxyethylene chain as a hydrophilic group, the mass ratio (A)/(B) of component (A) with respect to component (B) being 0.05-30, and the ratio ((A)+(B))/((C)+(D)+(G)) of the total mass of components (A) and (B) with respect to the total mass of components (C), (D), and (G) being 0.1-1.5.本發明之皮膚洗淨劑組成物含有以下之成分(A)、(B)、(C)、(D)、(E)、(F)及(G):(A)30℃下之黏度超過30mPa.s之油劑0.5~20質量%、(B)30℃下之黏度為30mPa.s以下之油劑0.5~20質量%、(C)具有將糖、還原糖或聚甘油中之至少1個羥基之氫原子去除而獲得之殘基作為親水基之HLB為10以上之非離子性界面活性劑1~15質量%、(D)HLB為8以下之非離子性界面活性劑1~15質量%、(E)多元醇10~60質量%、(F)水10~50質量%、及(G)具有聚氧乙烯鏈作為親水基之HLB為10以上之非離子性界面活性劑4~45質量%;並且,成分(A)相對於成分(B)之質量比(A)/(B)為0.05~30,成分(A)及(B)之合計質量相對於成分(C)、(D)及(G)之合計質量之比((A)+(B))/((C)+(D)+(G))為0.1~1.5。
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中国工程科技知识中心
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