Disclosed is a device that is configured to be implanted adjacent interspinous processes of a patient. In one aspect, a spinal implant device comprises: a spacer region adapted to be positioned between first and second spinous processes of first and second vertebral bodies to limit movement of the first spinous process and the second spinous process toward one another and an attachment region attached to the spacer region, the attachment region adapted to attach to the first spinous process via a fastener, the attachment region comprising a pair of pads having attachment elements that are configured to attach onto the spinous process.
