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NAIL POLISH COMPOSITION SYSTEM AND METHOD OF APPLYING SAME
专利权人:
Chin Hao Chang
发明人:
Chin Hao Chang
申请号:
US16521417
公开号:
US20200030206A1
申请日:
2019.07.24
申请国别(地区):
US
年份:
2020
代理人:
摘要:
A nail polish composition system includes (a) a base coat nail polish composition including organic solvents, film-forming compounds, plasticizers, and one or more additives; and (b) a top coat nail polish composition including a mixture of cyanoacrylates and a methacrylate. The base coat nail polish composition is applied to a fingernail to form a base coat film. Thereafter, the top coat nail polish composition is applied on or over the base coat film to form a top coat film. The nail polish composition system can significantly shorten the time required for drying the base and top coat nail polish compositions. In addition, the nail polish composition system may be applied without dipping the fingernail in powder glaze.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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