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FOCUSING SYSTEM AND METHOD
专利权人:
发明人:
Kenichi SAITO
申请号:
US14632971
公开号:
US20160249803A1
申请日:
2015.02.26
申请国别(地区):
US
年份:
2016
代理人:
摘要:
An apparatus for measuring a fundus of a subject. The apparatus includes a focusing unit which adjusts a defocus of the apparatus. The focusing unit includes a first focusing mirror and a second focusing mirror. The first focusing mirror and second focusing mirror are arranged so that an incident beam from the light source entering the focusing unit and an emitted beam exiting the focusing unit are substantially parallel to each other. Adjustment of the defocus is accomplished by moving both first focusing mirror and second focusing mirror such that incident beam and emitted beam remain substantially parallel to each other. The apparatus includes a wavefront sensor for detecting a shape of a wavefront. The apparatus includes a wavefront correction device. The wavefront correction device adjusts a wavefront of the light from the light source based on the shape of the wavefront detected by the wavefront sensor.
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中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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kenichi saito
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