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SKIN CLEANSING COMPOSITION
专利权人:
KAO CORPORATION
发明人:
NAOKO YAMAMOTO,山本奈绪子,山本奈緒子,MASAKI SHIMIZU,清水真规,清水真規,NATSUKO TOSHIDA,东西田奈都子,東西田奈都子
申请号:
TW097109002
公开号:
TWI434703B
申请日:
2008.03.14
申请国别(地区):
TW
年份:
2014
代理人:
摘要:
A skin cleansing composition contains, inaddition to water, the following ingredients (A) to (D): (A) a polyoxyethylene alkylether sulfate, (B) an ether carboxylic acid-type surfactant, (C) an alkyl polyglycoside, and (D) one or more of a higher fatty acid and a higher alcohol. A total amount of the ingredients (A), (B) and (C) ranges from 5 to 30 wt% based on the whole composition, with the ingredient (A) amounting to from 20 to 80 wt%, the ingredient (B) amounting to from 7 to 70 wt%, and the ingredient (C) amounting to from 7 to 70 wt%, the amount of the ingredient (D) ranges from 0.3 to 3 wt% based on the whole composition. A pH of the composition ranges from 4.5 to 7 when diluted to 5 wt% by weight with deionized water. The skin cleansing composition can produce abundant foam of fine and smooth quality without an increase in foam viscosity, and therefore, allows the body to be washed with comfort.本發明為一種皮膚洗淨劑組成物,其含有:(A)聚氧乙烯烷基醚硫酸鹽;(B)醚羧酸型界面活性劑;(C)烷基多糖苷(alkyl polyglycoside);(D)高級脂肪酸及/或高級醇;以及水;(A)、(B)及(C)之合計含有量佔總組成之5~30質量%,其細分係(A)20~80質量%,(B)7~70質量%,(C)7~70質量%;(D)係於總組成中含有0.3~3質量%;以離子交換水稀釋為5質量%時之pH為4.5~7。此皮膚洗淨劑組成物係質地細緻且泡質滑順,泡沫量多且泡沫黏性不會增高,可舒適地清洗身體。
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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