A suture retention device is provided for retaining a suture. The device has a locked state and an unlocked state. In the locked state, a spring biases a first gripping surface and second gripping surface together to enmesh a suture to prevent the suture from sliding through the device. In the unlocked state, an actuator may be engaged to bias the spring and separate the first and second gripping surfaces to allow the suture to freely slide through the device.
