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Mild cosmetic cleansing composition
专利权人:
发明人:
Madlen Fahl,Dirk Hentrich,Thomas Schroeder,Jens Meyer
申请号:
US14256499
公开号:
US09216147B2
申请日:
2014.04.18
申请国别(地区):
US
年份:
2015
代理人:
摘要:
A mild cosmetic cleansing agent includes in a suitable carrier a) 1 to 6 wt. % of at least one anionic surfactant of the following formula (I),in which R1 denotes a linear or branched, saturated or unsaturated alkyl residue having 6 to 30 carbon atoms, at least one of the residues R2 to R5 denotes a C1-C4 alkyl residue, and the other residues independently of one another denote a hydrogen atom or a C1-C4 alkyl residue, and M+ denotes an ammonium, alkanolammonium or metal cation, b) 2 to 10 wt. % of at least one amphoteric and/or zwitterionic surfactant and c) 0.5 to 10 wt. % of at least one non-ionic surfactant and/or at least one non-ionic emulsifier, selected from at least one of the following groups of alkyl (oligo)glycosides, amine oxides and/or glycerol mono- and/or di(C6-C24) carboxylic acid esters, wherein the stated amounts relate to the total weight.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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