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Far-infrared baking facility
专利权人:
WANG; WEN-JI
发明人:
WANG, WEN-JI,王文己,王文己
申请号:
TW101204194
公开号:
TWM431701U
申请日:
2012.03.08
申请国别(地区):
TW
年份:
2012
代理人:
摘要:
The outer Line Hong Kao Let Prepare of this Chong Zuo Department mono- Seed Far Red, there is a bottom plate including a Rong Shi Let, two Side walls, one Hou wall, one Top plates, one seat Yi is Ji the door leafs Yi Door, The Zuo Wei Department Let are set on what The bottom plates and the nearly bis- Side walls of what The of O and The Hou walls, its Inner Bu Department Let has a Jia Hot Installed to set, more Ge the first make pottery on the seats porcelain Body Department Installed Let what The, And arrangements what The more potteries of Ge the first peripheries porcelain Body on more potteries of Ge the 2nd seats porcelain Body Department Installed Let what The, more Ge the 3rd make pottery porcelain Body Department in Array column Like arrangements and the bis- Side walls of The and the seats The Hou wall And O nearly what The of Installed Let what The room Inner Side, the The Top plates of more the 4th Tao Ci Body Department Installed Let what The room Inner Side of Ge, by the more Ge first of The, second, third, the efficient configuration of 4th Tao Ci Body, and the outer Line Radiation of the equal Uniform Far Red of energy Enough Ti Gong Ren Body penetrate effect.本創作係一種遠紅外線烘烤設備,包括一容室設有一底板、二側壁、一後壁、一頂板、一座位以及一門扉,該座位係設置於該底板上且鄰近於該二側壁及該後壁,其內部係設有一加熱裝置,多個第一陶瓷體係裝設於該座位上,多個第二陶瓷體係裝設於該座位上並排列於該多個第一陶瓷體外周,多個第三陶瓷體係呈陣列狀排列且裝設於該容室內側的該二側壁及該後壁並鄰近於該座位,多個第四陶瓷體係裝設於該容室內側的該頂板,藉由該多個第一、第二、第三、第四陶瓷體的有效率的配置,而能夠提供人體均勻的遠紅外線輻射效果。
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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