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Method for enhancing drug sensitivity of drug-resistant pathogenic microorganisms and method for preventing the appearance of highly drug-resistant bacteria
专利权人:
国立大学法人山口大学
发明人:
白井 睦訓,東 慶直
申请号:
JP2006260536
公开号:
JP5061345B2
申请日:
2006.09.26
申请国别(地区):
JP
年份:
2012
代理人:
摘要:
<;P>;PROBLEM TO BE SOLVED: To provide a means for reducing opportunistic infectious disease caused by a drug-resistant germ for a patient without immuno-protection and a serious hospital infection problem such as postoperative infection. <;P>;SOLUTION: Disclosed are a method for enhancing the sensitivity of a drug-resistant pathogenic microorganism against an antimicrobial substance by irradiating LED light with a wave length of 400-410 nm and a peak wave length of 405 nm in the presence of the antimicrobial substance, and a method for preventing the appearance of a pathogenic microorganism such as MRSA with high drug-resistance by irradiating LED light in the presence of high concentration of the antimicrobial substance. <;P>;COPYRIGHT: (C)2008,JPO&INPIT
来源网站:
中国工程科技知识中心
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http://www.ckcest.cn/home/

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