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Système d'irradiation à particules chargées
专利权人:
HITACHI; LTD.
发明人:
申请号:
EP08011251.9
公开号:
EP2005993B1
申请日:
2008.06.20
申请国别(地区):
EP
年份:
2015
代理人:
摘要:
An object of the present invention is to provide a charged particle irradiation system that is capable of improving irradiation positional accuracy of a charged particle beam at a target position and is capable of decreasing the possibility that a normal tissue will be irradiated. A charged particle irradiation system includes an acceleration system 6 for extracting a charged particle beam, scanning magnets 24 and 25, and charged particle beam position monitors 26 and 27. On the basis of signals received from the charged particle beam position monitors 26 and 27, the control unit 70 calculates a beam position at a target position and then controls the scanning magnets 24 and 25 so that the charged particle beam is moved to a desired irradiation position at the target position. The control unit 70 corrects the value of an excitation current applied to each of the scanning magnets 24 and 25 on a specified cycle basis on the basis of information about the position and the angle of the charged particle beam.
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