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MASK SYSTEM
专利权人:
Alison Oldenburg;Steven John Lubke;James William Charles Vandyke;Rupert Christian Scheiner;Michael John Reid;Timothy Shawn Nelson;Gregory Scott Smart;Philip Rodney Kwok;Christopher Scott Skipper;Karth
发明人:
Steven John Lubke,Gregory Scott Smart,Rupert Christian Scheiner,Alison Oldenburg,James William Charles Vandyke,Christopher Scott Skipper,Michael John Reid,Timothy Shawn Nelson,Philip Rodney Kwok,Karth
申请号:
US13399832
公开号:
US20120145158A1
申请日:
2012.02.17
申请国别(地区):
US
年份:
2012
代理人:
摘要:
A headgear assembly for a mask system includes a two-dimensional first headgear section and a two-dimensional second headgear section, wherein the two-dimensional first and second headgear sections are attached to one another to form a three-dimensional anatomically-shaped headgear assembly.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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